Product Category | Thin film materials |
Main Products | Co-Cr-Pt-Oxide Target, Fe-Pt Target, Mn Alloy Target, Fe Alloy Target |
Primary Applications | Hard disk media, hard disk heads, MRAM |
Recording layer | Co-Cr-Pt-Oxide1(-Oxide2)(-Oxide3)(-Oxide4) Co-Cr-Pt-X1-X2-Oxide1(-Oxide2)(-Oxide3)(-Oxide4) Co-Cr-Pt-B(-X1)(-X2) X1 and X2 are metals |
Main Products | Ni-W(-X), Co-Cr(-X), Co-Cr-Oxide 1(-Oxide 2), etc. X is a metal |
Under layer | Co-Fe(-X1)(-X2), Co-Fe-B(-X) X1 and X2 are metals. |
Mn alloy | Mn-Pt, Mn-Ir, Mn-Ir-Cr, etc. (Low oxygen content achieved by our proprietary technology) |
Ni alloy | Ni-Fe, Ni-Cr, Ni-Fe-Cr, Ni-Fe-X |
Co alloy | Co-Fe, Co-Fe-B, Co-Fe-X, Co-Cr-Pt, Co-Nb-Zr |
Other | Fe-Pt, Au-X, Heusler Alloys, MgO, Ru |
Melting, casting Rolling Forging Powder raw material manufacturing Milling, mixing Powder metallurgy Machining, surface finishing Precious metal refining Physical properties evaluation (XRD, EPMA, etc.) Sputtering evaluation |
Customers’ needs
Metallurgical structure control Magnetic permeability control High density Higher PTF, stable electric discharge Low oxygen impurities Stabilization of oxygen amount (products containing oxides) Process strain reduction Fast evaluation of properties, development of next-generation technologies |
Recording layer | Co-Cr-Pt-Oxide1(-Oxide2)(-Oxide3)(-Oxide4) Co-Cr-Pt-X1-X2-Oxide1(-Oxide2)(-Oxide3)(-Oxide4) Co-Cr-Pt-B(-X1)(-X2) X1 and X2 are metals |
Main Products | Ni-W(-X), Co-Cr(-X), Co-Cr-Oxide 1(-Oxide 2), etc. X is a metal |
Under layer | Co-Fe(-X1)(-X2), Co-Fe-B(-X) X1 and X2 are metals. |
Mn alloy | Mn-Pt, Mn-Ir, Mn-Ir-Cr, etc. (Low oxygen content achieved by our proprietary technology) |
Ni alloy | Ni-Fe, Ni-Cr, Ni-Fe-Cr, Ni-Fe-X |
Co alloy | Co-Fe, Co-Fe-B, Co-Fe-X, Co-Cr-Pt, Co-Nb-Zr |
Other | Fe-Pt, Au-X, Heusler Alloys, MgO, Ru |
Melting, casting Rolling Forging Powder raw material manufacturing Milling, mixing Powder metallurgy Machining, surface finishing Precious metal refining Physical properties evaluation (XRD, EPMA, etc.) Sputtering evaluation |
Customers’ needs
Metallurgical structure control Magnetic permeability control High density Higher PTF, stable electric discharge Low oxygen impurities Stabilization of oxygen amount (products containing oxides) Process strain reduction Fast evaluation of properties, development of next-generation technologies |
125 N Price Rd, Chandler, AZ 85224
Open ⋅ Closes 5PM